INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC. FILES APPLICATION FOR "BOTTOM-UP DIRECTIONAL ATOMIC LAYER DEPOSITION (ALD)"

GENEVA, Sept. 10 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704) filed a patent application (PCT/US2025/010713) for "BOTTOM-UP DIRECTIONAL ATOMIC LAYER DEPOSITION (ALD)" on Jan 08, 2025. With publication no. WO/2025/183790, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): IWAO, Toshihiko (650 MitsuzawaHosaka-cho, Nirasaki City, Yamanashi 407-0192)

Abstract: A method of film deposition is provided. The method includ...