INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, TOKYO ELECTRON U.S. HOLDINGS, INC., THE REGENTS OF THE UNIVERSITY OF COLORADO FILES APPLICATION FOR "NOVEL OVERLAYER FILMS AND METHODS FOR ETCHING SILICON-CONTAINING MATERIALS USING A LOW TEMPERATURE DRY CHEMICAL ETCH PROCESS"

GENEVA, Jan. 27 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), TOKYO ELECTRON U.S. HOLDINGS, INC. (401 S 1st St, Suite 900Austin, Texas 78704), THE REGENTS OF THE UNIVERSITY OF COLORADO (1800 Grant Street8Th FloorDenver, Colorado 80203) filed a patent application (PCT/US2025/026979) for "NOVEL OVERLAYER FILMS AND METHODS FOR ETCHING SILICON-CONTAINING MATERIALS USING A LOW TEMPERATURE DRY CHEMICAL ETCH PROCESS" on Apr 30, 2025. With publication no. WO/2026/019469, the details related to the patent application was published on Jan 22, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIP...