INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, INTERNATIONAL BUSINESS MACHINES CORPORATION FILES APPLICATION FOR "PILLAR CRITICAL DIMENSION REDUCTION BY ISOTROPIC PLASMA ETCHING WITH HIGH SELECTIVITY TO SILICON-CONTAINING ANTIREFLECTIVE COATING AND SILICON NITRIDE"

GENEVA, Sept. 17 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-kuTokyo, 107-6325), INTERNATIONAL BUSINESS MACHINES CORPORATION (1 New Orchard RoadArmonk, New York 10504) filed a patent application (PCT/US2025/014028) for "PILLAR CRITICAL DIMENSION REDUCTION BY ISOTROPIC PLASMA ETCHING WITH HIGH SELECTIVITY TO SILICON-CONTAINING ANTIREFLECTIVE COATING AND SILICON NITRIDE" on Jan 31, 2025. With publication no. WO/2025/188441, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BUZI, Luxherta (IBM1101 Kitchawan RdYorkto...