INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM"

GENEVA, March 3 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/027897) for "SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM" on Aug 05, 2024. With publication no. WO/2025/041580, the details related to the patent application was published on Feb 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HAYAKAWA,...