INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD, HARD MASK FORMING METHOD AND SUBSTRATE PROCESSING DEVICE"

GENEVA, Dec. 9 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2025/019287) for "SUBSTRATE PROCESSING METHOD, HARD MASK FORMING METHOD, AND SUBSTRATE PROCESSING DEVICE" on May 28, 2025. With publication no. WO/2025/249475, the details related to the patent application was published on Dec 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO...