INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE LIQUID PROCESSING DEVICE, SUBSTRATE LIQUID PROCESSING METHOD AND COMPUTER-READABLE RECORDING MEDIUM"

GENEVA, Dec. 1 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2025/016967) for "SUBSTRATE LIQUID PROCESSING DEVICE, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM" on May 09, 2025. With publication no. WO/2025/243862, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Pro...