GENEVA, March 17 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/031341) for "PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD" on Aug 30, 2024. With publication no. WO/2025/053086, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): OHISHI, Tetsuya...