INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PLASMA PROCESSING DEVICE, BIAS ELECTRIC POWER SUPPLY SYSTEM AND PLASMA PROCESSING METHOD"

GENEVA, Sept. 16 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2025/006126) for "PLASMA PROCESSING DEVICE, BIAS ELECTRIC POWER SUPPLY SYSTEM, AND PLASMA PROCESSING METHOD" on Feb 21, 2025. With publication no. WO/2025/187457, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (...