INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "ETCHING METHOD AND PLASMA PROCESSING SYSTEM"

GENEVA, July 21 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東京都港区赤坂五丁目３番１号) filed a patent application (PCT/JP2024/045899) for "ETCHING METHOD AND PLASMA PROCESSING SYSTEM" on Dec 25, 2024. With publication no. WO/2025/150427, the details related to the patent application was published on Jul 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUZUKI, Takayuki (c/o Toky...