INTERNATIONAL PATENT: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY FILES APPLICATION FOR "APPARATUS AND METHOD FOR DRY ETCHING OF ALUMINUM GALLIUM ARSENIDE OPTICAL WAVEGUIDES USING ARGON GAS PLASMA"

GENEVA, July 28 -- THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Clear Water Bay, KowloonHong Kong) filed a patent application (PCT/CN2025/072705) for "APPARATUS AND METHOD FOR DRY ETCHING OF ALUMINUM GALLIUM ARSENIDE OPTICAL WAVEGUIDES USING ARGON GAS PLASMA" on Jan 16, 2025. With publication no. WO/2025/153009, the details related to the patent application was published on Jul 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TAN, Bo Xue (The Hong Kong University Of Science And Technology, Clear Water Bay, KowloonHong Kong), POON, Wing On Andrew (The Hong Kong University Of Science...