INTERNATIONAL PATENT: THE HONG KONG RESEARCH INSTITUTE OF TEXTILES AND APPAREL LIMITED FILES APPLICATION FOR "METHOD AND SYSTEM FOR SELECTIVE NYLON EXTRACTION FROM BLENDED TEXTILE"

GENEVA, Nov. 30 -- THE HONG KONG RESEARCH INSTITUTE OF TEXTILES AND APPAREL LIMITED (R906, Shirley Chan Building, The Hong Kong Polytechnic University, Hung Hom, KowloonHong Kong) filed a patent application (PCT/CN2024/094653) for "METHOD AND SYSTEM FOR SELECTIVE NYLON EXTRACTION FROM BLENDED TEXTILE" on May 22, 2024. With publication no. WO/2025/241106, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YAO, Gloria Lei (R906, Shirley Chan Building, The Hong Kong Polytechnic University, Hung Hom, KowloonHong Kong), NGAN, Eri...