INTERNATIONAL PATENT: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS FILES APPLICATION FOR "PLASMA BEAM LITHOGRAPHY SYSTEM AND METHOD"

GENEVA, May 15 -- THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (352 Henry Administration Building506 South Wright StreetUrbana, Illinois 61801) filed a patent application (PCT/US2024/054155) for "PLASMA BEAM LITHOGRAPHY SYSTEM AND METHOD" on Nov 01, 2024. With publication no. WO/2025/096972, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUBRAMANIAN, Arunkumar (840 S Wood StChicago, Illinois 60612)

Abstract: Various examples are provided related to Plasma Beam Lithography (PBL). In one example, a PBL system inc...