INTERNATIONAL PATENT: TEXTRON SYSTEMS CORPORATION FILES APPLICATION FOR "CONTINUOUS BIAS PATTERN FABRIC"

GENEVA, May 15 -- TEXTRON SYSTEMS CORPORATION (124 Industry LaneMS 9050/300Hunt Valley, Maryland 21030) filed a patent application (PCT/US2024/039717) for "CONTINUOUS BIAS PATTERN FABRIC" on Jul 26, 2024. With publication no. WO/2025/096032, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PERRONE, Matthew Weis (34 Rutland Square, Apt. 3Boston, Massachusetts 02118), CHAPKIN, Wesley Aaron (21 Executive Drive, Unit 316Stoneham, Massachusetts 02180), SALVUCCI, Michael Vincent (22 Nelson StreetClinton, Massachusetts 01510), FA...