GENEVA, March 18 -- SPARKNANO B.V. (Esp 2665633 AC Eindhoven) filed a patent application (PCT/NL2024/050487) for "PLASMA SOURCE FOR PATTERNED DEPOSITION" on Sep 06, 2024. With publication no. WO/2025/053756, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): TIELEN, Viktor (c/o Esp 2665633 AC Eindhoven), SMELTINK, Jeroen Antonius (c/o Esp 2665633 AC Eindhoven), POODT, Paul (c/o Esp 2665633 AC Eindhoven)
Abstract:
A plasma source (100) comprises a plasma deposition head (110) with an aperture (111) for delivering an atmosp...