INTERNATIONAL PATENT: SOULBRAIN CO., LTD., 솔브레인 주식회사 FILES APPLICATION FOR "ETCHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME"

GENEVA, Aug. 12 -- SOULBRAIN CO., LTD. (34, Pangyo-ro 255beon-gilBundang-gu, Seongnam-si,Gyeonggi-do 13486), 솔브레인 주식회사 (경기도성남시 분당구판교로255번길 34) filed a patent application (PCT/KR2025/099220) for "ETCHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME" on Feb 03, 2025. With publication no. WO/2025/165211, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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