INTERNATIONAL PATENT: SOULBRAIN CO., LTD., 솔브레인 주식회사 FILES APPLICATION FOR "BRITTLENESS AND RESISTIVITY IMPROVER, METHOD FOR FORMING HETEROGENEOUS FILM USING SAME AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURED THEREFROM"

GENEVA, Oct. 14 -- SOULBRAIN CO., LTD. (34, Pangyo-ro 255beon-gil, Bundang-gu,Seongnam-si,Gyeonggi-do 13486), 솔브레인 주식회사 (경기도성남시분당구 판교로255번길 34) filed a patent application (PCT/KR2025/001419) for "BRITTLENESS AND RESISTIVITY IMPROVER, METHOD FOR FORMING HETEROGENEOUS FILM USING SAME, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURED THEREFROM" on Jan 24, 2025. With publication no. WO/2025/211553, the details related to the patent application was published on Oct 09, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) syste...