INTERNATIONAL PATENT: SOITEC FILES APPLICATION FOR "MULTI-STEP CHEMICAL-MECHANICAL POLISHING METHOD FOR MATERIALS USED IN THE SEMICONDUCTOR INDUSTRY"

GENEVA, Sept. 21 -- SOITEC (PARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN) filed a patent application (PCT/EP2025/053937) for "MULTI-STEP CHEMICAL-MECHANICAL POLISHING METHOD FOR MATERIALS USED IN THE SEMICONDUCTOR INDUSTRY" on Feb 13, 2025. With publication no. WO/2025/190600, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): QUINTERO-COLMENARES, Andrea (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN), ROUCHIER, Severin (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQ...