INTERNATIONAL PATENT: SOITEC FILES APPLICATION FOR "METHOD FOR PRODUCING A SOI STRUCTURE, IN PARTICULAR SUITABLE FOR PHOTONIC APPLICATIONS AND CARRIER SUBSTRATE FOR THE STRUCTURE"

GENEVA, June 2 -- SOITEC (PARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN) filed a patent application (PCT/EP2024/082138) for "METHOD FOR PRODUCING A SOI STRUCTURE, IN PARTICULAR SUITABLE FOR PHOTONIC APPLICATIONS, AND CARRIER SUBSTRATE FOR THE STRUCTURE" on Nov 13, 2024. With publication no. WO/2025/108793, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DURET, Carine (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINESCHEMIN DES FRANQUES38190 BERNIN), BERTRAND, Isabelle (C/O SOITECPARC TECHNOLOGIQUE DES FONTAINES...