INTERNATIONAL PATENT: SOCTERA, INC. FILES APPLICATION FOR "CURRENT COLLAPSE REDUCTION USING ALUMINUM NITRIDE BACK BARRIER AND IN-SITU TWO-STEP PASSIVATION"

GENEVA, March 26 -- SOCTERA, INC. (350 F Duffield HallIthaca, New York 14853) filed a patent application (PCT/US2024/046246) for "CURRENT COLLAPSE REDUCTION USING ALUMINUM NITRIDE BACK BARRIER AND IN-SITU TWO-STEP PASSIVATION" on Sep 11, 2024. With publication no. WO/2025/059208, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HICKMAN, Austin (c/o Soctera, Inc.350 F Duffield HallIthaca, New York 14853), JENA, Debdeep (c/o Soctera, Inc.350 F Duffield HallIthaca, New York 14853)

Abstract: Device structures and methods fo...