INTERNATIONAL PATENT: SK TRI CHEM CO., LTD., 에스케이트리켐 주식회사 FILES APPLICATION FOR "PRECURSOR FOR FORMING LOW-PERMITTIVITY SILICON-CONTAINING THIN FILM AND METHOD FOR FORMING LOW-PERMITTIVITY SILICON-CONTAINING THIN FILM BY USING SAME"

GENEVA, Oct. 14 -- SK TRI CHEM CO., LTD. (110-5, Myeonghaksandan-ro, Yeondong-myeonSejong 30068), 에스케이트리켐 주식회사 (세종특별자치시연동면 명학산단로 110-5) filed a patent application (PCT/KR2025/004128) for "PRECURSOR FOR FORMING LOW-PERMITTIVITY SILICON-CONTAINING THIN FILM, AND METHOD FOR FORMING LOW-PERMITTIVITY SILICON-CONTAINING THIN FILM BY USING SAME" on Mar 31, 2025. With publication no. WO/2025/211659, the details related to the patent application was published on Oct 09, 2025.

Notably, the patent application was submitted under the International Patent Classification (IP...