INTERNATIONAL PATENT: SK TRI CHEM CO., LTD., 에스케이트리켐 주식회사 FILES APPLICATION FOR "PRECURSOR FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM AND METHOD FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM BY USING SAME"

GENEVA, Aug. 19 -- SK TRI CHEM CO., LTD. (110-5, Myeonghaksandan-ro, Yeondong-myeonSejong 30068), 에스케이트리켐 주식회사 (세종특별자치시연동면 명학산단로 110-5) filed a patent application (PCT/KR2025/000268) for "PRECURSOR FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM AND METHOD FOR FORMING LOW-DIELECTRIC CONSTANT SILICON-CONTAINING THIN FILM BY USING SAME" on Jan 07, 2025. With publication no. WO/2025/170206, the details related to the patent application was published on Aug 14, 2025.

Notably, the patent application was submitted under the International Patent Class...