GENEVA, Nov. 18 -- SILUETA PRIVATE LIMITED (Lot No, 14, Zone 1, BEPZ, Walgama,Malwana), MATTEUCCI, Gianfranco (Marks & Clerk Singapore LLP,Privy Box No. 920258,Singapore 929292) filed a patent application (PCT/SG2025/050305) for "A FABRIC COMPRISING A POLYMER ARRANGED IN A PATTERN" on May 06, 2025. With publication no. WO/2025/234941, the details related to the patent application was published on Nov 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LEANAGE, Nadeekha (c/o Silueta Private Limited,Lot No, 14, Zone 1, BEPZ, Walgama,Malwana), LIYANAGAMAGE, Ishara (c/o Silueta Private Limited,L...