INTERNATIONAL PATENT: SILTRONIC AG FILES APPLICATION FOR "METHOD FOR DETERMINING CRYSTAL DEFECTS IN A WORKPIECE MADE OF MONOCRYSTALLINE SILICON"

GENEVA, Nov. 17 -- SILTRONIC AG (Einsteinstr. 172 Tower B / Blue Tower81677 Munchen) filed a patent application (PCT/EP2025/060084) for "METHOD FOR DETERMINING CRYSTAL DEFECTS IN A WORKPIECE MADE OF MONOCRYSTALLINE SILICON" on Apr 11, 2025. With publication no. WO/2025/233084, the details related to the patent application was published on Nov 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): EHLERT, Andreas (Goethestr. 1184547 Emmerting), KNIPPERTZ, Johannes (Tulpenweg 1184489 Burghausen), KOMODA, Mitsunori (Robert-Koch-Str. 7584489 Burghausen)

Abstract: The invention relates to a method ...