INTERNATIONAL PATENT: SILICONIX INCORPORATED FILES APPLICATION FOR "METHOD FOR FORMING A SEMICONDUCTOR DEVICE AND A STRUCTURE FORMED BY THE METHOD"

GENEVA, Feb. 19 -- SILICONIX INCORPORATED (2585 Junction AvenueSan Jose, California 95134) filed a patent application (PCT/US2024/040673) for "METHOD FOR FORMING A SEMICONDUCTOR DEVICE, AND A STRUCTURE FORMED BY THE METHOD" on Aug 02, 2024. With publication no. WO/2025/034536, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LIN, Barry (3-4 East 2nd StreetNanzi Dist.Kaohsiung, 811 ROC), CHIU, Tony (3-4 East 2nd StreetNanzi Dist.Kaohsiung, 811 ROC)

Abstract: A method for assembling a chip includes attaching a first side ...