GENEVA, July 3 -- SIEMENS INDUSTRY SOFTWARE INC. (5800 Granite Parkway, Suite 600Plano, Texas 75024) filed a patent application (PCT/US2023/085761) for "PATTERNING METHOD FOR COMPUTER AIDED DESIGN" on Dec 22, 2023. With publication no. WO/2025/136414, the details related to the patent application was published on Jun 26, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): FERGUSON, John (Kett House, Station RoadCambridge CB1 2JH), ROUSSEAU, Iddo (Kett House, Station RoadCambridge CB1 2JH)
Abstract:
A method for modifying a model of a shape element in a computer-aided design (CAD) system. The ...