INTERNATIONAL PATENT: SIEMENS INDUSTRY SOFTWARE INC. FILES APPLICATION FOR "MODEL FORM DETERMINATIONS FOR OPTICAL PROXIMITY CORRECITON (OPC) MODELS FOR ELECTRONIC DESIGN AUTOMATION (EDA) DESIGN FLOWS"

GENEVA, Jan. 20 -- SIEMENS INDUSTRY SOFTWARE INC. (5800 Granite Parkway, Suite 600Plano, Texas 75024) filed a patent application (PCT/US2024/037059) for "MODEL FORM DETERMINATIONS FOR OPTICAL PROXIMITY CORRECITON (OPC) MODELS FOR ELECTRONIC DESIGN AUTOMATION (EDA) DESIGN FLOWS" on Jul 08, 2024. With publication no. WO/2026/015128, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KIM, Young Chang (3621 Gleason AvenueSan Jose, California 95130), QI, Xiaoyuan (9026 NW Wood Rose LoopPortland, Oregon 97229), FENGER, Germain Lou...