GENEVA, Oct. 1 -- SIEMENS ENERGY, INC. (4400 N. Alafaya TrailOrlando, Florida 32826) filed a patent application (PCT/US2025/019093) for "SYSTEM AND METHOD FOR REPAIRING A GAS TURBINE VANE" on Mar 10, 2025. With publication no. WO/2025/198880, the details related to the patent application was published on Sep 25, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): OLEJARSKI, Michael (235 Annalisa PlaceMerritt Island, Florida 32953)
Abstract: A stationary turbine vane includes an outer shroud, an inner shroud, a vane extending between the outer shroud and the inner shroud, and an air tube positio...