GENEVA, Jan. 13 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京都千代田区丸の内一丁目４番１号) filed a patent application (PCT/JP2025/023021) for "SUBSTRATE FOR GROUP III NITRIDE EPITAXIAL GROWTH, METHOD FOR MANUFACTURING SAME, AND EPITAXIAL FILM MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD EACH USING SAME" on Jun 26, 2025. With publication no. WO/2026/009808, the details related to the patent application was published on Jan 08, 2026.
Notably, the patent application was submitted under the Inter...