INTERNATIONAL PATENT: SCHUNK XYCARB TECHNOLOGY B.V., SCHUNK KOHLENSTOFFTECHNIK GMBH FILES APPLICATION FOR "CLEANING METHOD FOR REMOVING PARASITIC GROWN SILICON CARBIDES AND AN INTERIOR PART OF AN EPITAXY PROCESS CHAMBER AND AN EPITAXY PROCESS SYSTEM"

GENEVA, July 3 -- SCHUNK XYCARB TECHNOLOGY B.V. (Zuiddijk 235705 CS Helmond), SCHUNK KOHLENSTOFFTECHNIK GMBH (Rodheimer StraBe 5935452 Heuchelheim) filed a patent application (PCT/NL2024/050698) for "CLEANING METHOD FOR REMOVING PARASITIC GROWN SILICON CARBIDES AND AN INTERIOR PART OF AN EPITAXY PROCESS CHAMBER AND AN EPITAXY PROCESS SYSTEM" on Dec 23, 2024. With publication no. WO/2025/136109, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SONG, Guiming (Zuiddijk 235705 CS Helmond), KOFER, Bernd (Rodheimer StraBe 593545...