INTERNATIONAL PATENT: SANDISK TECHNOLOGIES, INC. FILES APPLICATION FOR "PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES TO FORM A LINE-AND-SPACE PATTERN AND PHOTOMASK CONTAINING THE ASSIST FEATURES"

GENEVA, Feb. 25 -- SANDISK TECHNOLOGIES, INC. (951 Sandisk DriveMilpitas, California 95035) filed a patent application (PCT/US2024/030890) for "PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES TO FORM A LINE-AND-SPACE PATTERN AND PHOTOMASK CONTAINING THE ASSIST FEATURES" on May 23, 2024. With publication no. WO/2025/038155, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HISADOME, Shinichi (c/o Western Digital Technologies, Inc.,5601 Great Oaks ParkwaySan Jose, California 95119)

Abstract: A method of p...