INTERNATIONAL PATENT: S-GRAPHENE CO. LTD., (주)에스그래핀 FILES APPLICATION FOR "SILICON NEGATIVE ELECTRODE MATERIAL COATED WITH GRAPHENE PROTECTIVE LAYER AND MANUFACTURING METHOD THEREOF"

GENEVA, Sept. 9 -- S-GRAPHENE CO. LTD. (Room 113-114 ho, Main Building, Seoul National University Research Park, 1, Gwanak-roGwanak-guSeoul 08826), (주)에스그래핀 (서울특별시관악구관악로 1, 서울대학교 연구공원 본관 113-114호) filed a patent application (PCT/KR2024/095449) for "SILICON NEGATIVE ELECTRODE MATERIAL COATED WITH GRAPHENE PROTECTIVE LAYER AND MANUFACTURING METHOD THEREOF" on Feb 26, 2024. With publication no. WO/2025/183332, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the In...