INTERNATIONAL PATENT: S-GRAPHENE CO. LTD., (주)에스그래핀 FILES APPLICATION FOR "SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL COMPOSITION COMPRISING HYBRID ADDITIVE OF POLYSACCHARIDE SUBSTANCE AND NANO-CARBON MATERIAL, METHOD FOR PRODUCING SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL COMPOSITION AND SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL MANUFACTURED THEREBY"

GENEVA, Sept. 9 -- S-GRAPHENE CO. LTD. (Room 113-114 ho, Main Building, Seoul National University Research Park, 1, Gwanak-roGwanak-guSeoul 08826), (주)에스그래핀 (서울특별시관악구관악로 1, 서울대학교 연구공원 본관 113-114호) filed a patent application (PCT/KR2024/002431) for "SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL COMPOSITION COMPRISING HYBRID ADDITIVE OF POLYSACCHARIDE SUBSTANCE AND NANO-CARBON MATERIAL, METHOD FOR PRODUCING SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL COMPOSITION, AND SILICON-CARBON COMPOSITE NEGATIVE ELECTRODE MATERIAL MANUFACT...