INTERNATIONAL PATENT: ROBERT BOSCH GMBH FILES APPLICATION FOR "METHOD FOR PRODUCING AN SIC EPITAXIAL LAYER ON A FIRST MONOCRYSTALLINE SIC LAYER AND DEVICE HAVING AN SIC EPITAXIAL LAYER ON A FIRST MONOCRYSTALLINE SIC LAYER"

GENEVA, Oct. 4 -- ROBERT BOSCH GMBH (Postfach 30 02 2070442 Stuttgart) filed a patent application (PCT/EP2025/058429) for "METHOD FOR PRODUCING AN SIC EPITAXIAL LAYER ON A FIRST MONOCRYSTALLINE SIC LAYER AND DEVICE HAVING AN SIC EPITAXIAL LAYER ON A FIRST MONOCRYSTALLINE SIC LAYER" on Mar 27, 2025. With publication no. WO/2025/202375, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HEYERS, Klaus (Peter-Cornelius-Str. 2972766 Reutlingen), THOMAS, Bernd (Ginkgoweg 612487 Berlin), SCHOSER, Siegmar (Kirchstr. 4072127 Kusterdi...