INTERNATIONAL PATENT: RNR LAB INC., (주)알엔알랩 FILES APPLICATION FOR "HEATING DEVICE AND METHOD FOR HEATING TO-BE-PROCESSED SEMICONDUCTOR SUBSTRATE IN LASER ANNEALING PROCESS, LASER ANNEALING DEVICE AND METHOD USING SAME AND SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND METHOD"

GENEVA, Jan. 6 -- RNR LAB INC. (1102, 830 Dongtansunhwan-daeroHwaseong-SiGyeonggi-do 18464), (주)알엔알랩 (경기도화성시동탄순환대로 830 1102호) filed a patent application (PCT/KR2025/004709) for "HEATING DEVICE AND METHOD FOR HEATING TO-BE-PROCESSED SEMICONDUCTOR SUBSTRATE IN LASER ANNEALING PROCESS, LASER ANNEALING DEVICE AND METHOD USING SAME, AND SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND METHOD" on Apr 08, 2025. With publication no. WO/2026/005220, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system...