INTERNATIONAL PATENT: RION CO., LTD, 주식회사 리온 FILES APPLICATION FOR "SILICONE RESIN PAD FOR MANUFACTURING SEMICONDUCTOR HAVING PATTERN STRUCTURE"

GENEVA, Aug. 25 -- RION CO., LTD (18-18, Eunhaengnamu-ro 62beon-gil, Yanggam-myeonHwaseong-siGyeonggi-do 18633), 주식회사 리온 (경기도화성시양감면 은행나무로62번길 18-18) filed a patent application (PCT/KR2025/001888) for "SILICONE RESIN PAD FOR MANUFACTURING SEMICONDUCTOR HAVING PATTERN STRUCTURE" on Feb 10, 2025. With publication no. WO/2025/173997, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Invent...