INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "BASIC CHEMICAL STARTING MATERIAL COMPOSITION, MARKING SUBSTANCE FOR CARBON NEUTRAL CONFIRMATION AND ANALYSIS DEVICE, CERTIFICATION SYSTEM, PRODUCTION METHOD, ANALYSIS METHOD AND CERTIFICATION METHOD FOR BASIC CHEMICAL STARTING MATERIAL COMPOSITION"

GENEVA, Sept. 16 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都港区東新橋一丁目９番１号) filed a patent application (PCT/JP2024/008566) for "BASIC CHEMICAL STARTING MATERIAL COMPOSITION, MARKING SUBSTANCE FOR CARBON NEUTRAL CONFIRMATION, AND ANALYSIS DEVICE, CERTIFICATION SYSTEM, PRODUCTION METHOD, ANALYSIS METHOD, AND CERTIFICATION METHOD FOR BASIC CHEMICAL STARTING MATERIAL COMPOSITION" on Mar 06, 2024. With publication no. WO/2025/186952, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent ...