INTERNATIONAL PATENT: RAYTHEON COMPANY FILES APPLICATION FOR "TOPOLOGY- AUGMENTED SYSTEM FOR ALMODEL MISMATCH"

GENEVA, June 25 -- RAYTHEON COMPANY (870 Winter StreetWaltham, Massachusetts 02451-1449) filed a patent application (PCT/US2023/077425) for "TOPOLOGY- AUGMENTED SYSTEM FOR ALMODEL MISMATCH" on Oct 20, 2023. With publication no. WO/2025/128072, the details related to the patent application was published on Jun 19, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUNDARAMOORTHI, Ganesh (3415 McClure Woods DriveDuluth, Georgia 30096), SALPUKAS, Michael R. (16 Eaton RdLexington, Massachusetts 02420)

Abstract: A system and method estimate an uncertainty of an artificial neural network. A topolo...