INTERNATIONAL PATENT: RAITH GMBH FILES APPLICATION FOR "METHOD FOR INSPECTING A SEMICONDUCTOR SAMPLE USING A SECONDARY-ION MASS SPECTROMETER WITH A FOCUSED ION BEAM AND ANALYSIS DEVICE FOR THIS PURPOSE"

GENEVA, June 19 -- RAITH GMBH (Konrad-Adenauer-Allee44263 Dortmund) filed a patent application (PCT/DE2024/101052) for "METHOD FOR INSPECTING A SEMICONDUCTOR SAMPLE USING A SECONDARY-ION MASS SPECTROMETER WITH A FOCUSED ION BEAM, AND ANALYSIS DEVICE FOR THIS PURPOSE" on Dec 06, 2024. With publication no. WO/2025/119434, the details related to the patent application was published on Jun 12, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MANTZ, Ulrich (DiehlesgaBle 2/189601 Schelklingen), MULLER, Markus (Schurenkamp 1045770 Marl), OST, Alexander (109, route de Luxembourg7540 Rollingen), RASCH...