INTERNATIONAL PATENT: PSIQUANTUM, CORP. FILES APPLICATION FOR "INTERLEAVED LITHOGRAPHY OVERLAY CONTROL METHOD"

GENEVA, June 4 -- PSIQUANTUM, CORP. (700 Hansen WayPalo Alto, California 94304) filed a patent application (PCT/US2024/056582) for "INTERLEAVED LITHOGRAPHY OVERLAY CONTROL METHOD" on Nov 20, 2024. With publication no. WO/2025/111293, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HOSLER, Erik R. (c/o PSIQUANTUM CORP.700 Hansen WayPalo Alto, California 94304), LICAUSI, Nicholas V. (c/o PSIQUANTUM CORP.700 Hansen WayPalo Alto, California 94304)

Abstract: An interleaved lithography overlay control method includes exposin...