INTERNATIONAL PATENT: PRESIDENT AND FELLOWS OF HARVARD COLLEGE FILES APPLICATION FOR "SYSTEMS AND METHODS FOR DETERMINISTIC CREATION OF STRAINED COLOR CENTERS IN NANOSTRUCTURES VIA HIGH-STRESS THIN FILMS"

GENEVA, July 21 -- PRESIDENT AND FELLOWS OF HARVARD COLLEGE (17 Quincy StreetCambridge, MA 02138) filed a patent application (PCT/US2024/045233) for "SYSTEMS AND METHODS FOR DETERMINISTIC CREATION OF STRAINED COLOR CENTERS IN NANOSTRUCTURES VIA HIGH-STRESS THIN FILMS" on Sep 05, 2024. With publication no. WO/2025/151155, the details related to the patent application was published on Jul 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ASSUMPCAO, Daniel, R. (17 Oxford StreetCambridge, MA 02138), LONCAR, Marko (29 Oxford StreetCambridge, MA 02138), MACHIELSE, Bartolomeus (1284 Soldiers Fiel...