INTERNATIONAL PATENT: POLYTEKNIK A/S FILES APPLICATION FOR "TEMPERATURE CONTROL SYSTEM FOR A WAFER CHUCK, A MAGNETRON SPUTTER WITH SAID TEMPERATURE CONTROL SYSTEM AND A METHOD FOR SPUTTER DEPOSITION USING A MAGNETRON SPUTTER"

GENEVA, Feb. 24 -- POLYTEKNIK A/S (Mollegade 219750 Ostervra) filed a patent application (PCT/EP2024/072879) for "TEMPERATURE CONTROL SYSTEM FOR A WAFER CHUCK, A MAGNETRON SPUTTER WITH SAID TEMPERATURE CONTROL SYSTEM, AND A METHOD FOR SPUTTER DEPOSITION USING A MAGNETRON SPUTTER" on Aug 14, 2024. With publication no. WO/2025/036926, the details related to the patent application was published on Feb 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LARSEN, Jens William (Logtholtvej 19330 Dronninglund)

Abstract: A temperature control system (1) for a wafer chuck, wherein said system compr...