INTERNATIONAL PATENT: POLITECHNIKA WARSZAWSKA FILES APPLICATION FOR "RADIALLY VERTICALLY MACHINED RAIL AND USE THEREOF"

GENEVA, June 23 -- POLITECHNIKA WARSZAWSKA (Plac Politechniki 100-661 Warszawa) filed a patent application (PCT/IB2024/055655) for "RADIALLY VERTICALLY MACHINED RAIL AND USE THEREOF" on Jun 10, 2024. With publication no. WO/2025/125915, the details related to the patent application was published on Jun 19, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RATKIEWICZ, Andrzej (Makowa 2c05-822 Milanowek), KUKULSKI, Jacek (05-870 Dębowka)

Abstract: Rail possessing a head, a foot and a neck, wherein the neck connects the head to the rail foot. At the same time, the rail (11) possesses a ra...