INTERNATIONAL PATENT: POLITECHNIKA WARSZAWSKA FILES APPLICATION FOR "METHOD OF MANUFACTURING SEMICONDUCTOR RRAM MEMORY STRUCTURE BASED ON SILICON OXIDE AND STRUCTURE PRODUCED BY THIS METHOD"

GENEVA, Oct. 28 -- POLITECHNIKA WARSZAWSKA (Plac Politechniki 100-661 Warszawa) filed a patent application (PCT/PL2025/050036) for "METHOD OF MANUFACTURING SEMICONDUCTOR RRAM MEMORY STRUCTURE BASED ON SILICON OXIDE AND STRUCTURE PRODUCED BY THIS METHOD" on Apr 16, 2025. With publication no. WO/2025/221155, the details related to the patent application was published on Oct 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WIŚNIEWSKI, Piotr (Korkowa 159/2904-549 Warszawa), MAZURAK, Andrzej (Drawska 25/502-202 Warszawa), JASIŃSKI, Jakub (Elizy Orzeszkowej 12a95-020 Andrespol), MY...