GENEVA, July 29 -- PICOSUN OY (Tietotie 302150 Espoo) filed a patent application (PCT/FI2024/050705) for "ALD APPARATUS AND METHOD" on Dec 18, 2024. With publication no. WO/2025/153766, the details related to the patent application was published on Jul 24, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): BLOMBERG, Tom (c/o Picosun Oy, Masalantie 36502430 Masala)
Abstract:
An atomic layer deposition, ALD, method and apparatus, wherein an ALD film, such as aluminum oxide, is deposited onto a substrate (11) surface in a reaction chamber (10) by alternately introducing a precursor such as trim...