INTERNATIONAL PATENT: PARAGRAF LIMITED FILES APPLICATION FOR "A SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE THEREOF"

GENEVA, Sept. 29 -- PARAGRAF LIMITED (7-8 West NewlandsSomershamCambridgeshire PE28 3EB) filed a patent application (PCT/GB2025/050615) for "A SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE THEREOF" on Mar 21, 2025. With publication no. WO/2025/196460, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CURTO, Vincenzo (c/o Paragraf Limited7-8 West NewlandsSomershamCambridgeshire PE28 3EB)

Abstract: There is provided a semiconductor device (200) comprising: a substrate (205) having a patterned two-dimensional material layer ...