INTERNATIONAL PATENT: ONTO INNOVATION INC. FILES APPLICATION FOR "METROLOGY TO REDUCE OVERLAY ERROR"

GENEVA, Nov. 25 -- ONTO INNOVATION INC. (16 Jonspin RoadWilmington, MA 01887) filed a patent application (PCT/US2025/027854) for "METROLOGY TO REDUCE OVERLAY ERROR" on May 06, 2025. With publication no. WO/2025/240155, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BEST, Keith, F. (17 Somerset DriveAndover, 01810), HAN, Woo Young (16037 Peppertree RoadFrisco, TX 75035), CHANG, John (No. 92, Fuyin RoadTaichung)

Abstract: Various examples herein describe an apparatus and related method to track and correct alignment error...