GENEVA, April 21 -- OFINNO, LLC (1950 Opportunity WaySuite 1200Reston, Virginia 20190) filed a patent application (PCT/US2024/051314) for "LOCAL QUALITY PARAMETERS FOR CODING POINT CLOUD GEOMETRY" on Oct 15, 2024. With publication no. WO/2025/081176, the details related to the patent application was published on Apr 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LASSERRE, Sebastien (1950 Opportunity WaySuite 1200Reston, Virginia 20190), TAQUET, Jonathan (1950 Opportunity WaySuite 1200Reston, Virginia 20190)
Abstract:
A coder decodes, from a bitstream, quality unit information indicat...