INTERNATIONAL PATENT: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON FILES APPLICATION FOR "ARC SOURCE FOR HOMOGENEOUS REMOVAL OF THE TARGET SURFACE"

GENEVA, May 27 -- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON (Churerstrasse 1208808 Pfaffikon) filed a patent application (PCT/EP2024/081915) for "ARC SOURCE FOR HOMOGENEOUS REMOVAL OF THE TARGET SURFACE" on Nov 11, 2024. With publication no. WO/2025/103964, the details related to the patent application was published on May 22, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HAGMANN, Juerg (Farbbachstrasse 159468 Sax)

Abstract: The present invention relates to an arc evaporation source, comprising a target (1) to be operated as cathode, comprising material to be evaporated, the target (1) e...