INTERNATIONAL PATENT: NOKIA TECHNOLOGIES OY FILES APPLICATION FOR "APPARATUS AND METHOD FOR ENHANCED PARAMETER MANAGEMENT FOR ACCURATE DIGITAL POST-DISTORTION MODEL"

GENEVA, Nov. 10 -- NOKIA TECHNOLOGIES OY (Karakaari 702610 Espoo) filed a patent application (PCT/IB2025/054540) for "APPARATUS AND METHOD FOR ENHANCED PARAMETER MANAGEMENT FOR ACCURATE DIGITAL POST-DISTORTION MODEL" on Apr 30, 2025. With publication no. WO/2025/229578, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NIELSEN, Martin Hedegaard (Alfred Nobels Vej 279220 Aalborg), BARBU, Oana-Elena (Alfred Nobels Vej 279220 Aalborg), JALILI, Feridoon (Alfred Nobels Vej 279220 Aalborg), ALI, Samad (Karakaari 1302610 Espoo)

A...