INTERNATIONAL PATENT: NOF CORPORATION, 日油株式会社 FILES APPLICATION FOR "ADDITIVE FOR CMP AND CMP COMPOSITION CONTAINING SAME"

GENEVA, May 13 -- NOF CORPORATION (4-20-3, Ebisu, Shibuya-ku, Tokyo1506019), 日油株式会社 (東京都渋谷区恵比寿４－２０－３) filed a patent application (PCT/JP2024/038406) for "ADDITIVE FOR CMP, AND CMP COMPOSITION CONTAINING SAME" on Oct 28, 2024. With publication no. WO/2025/094907, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SUGIURA Midori (c/o NOF CORPORATION, 3-3, Chidori-cho, Kawasaki-ku, K...